JPH0715132Y2 - プラズマcvd装置の電極構造 - Google Patents
プラズマcvd装置の電極構造Info
- Publication number
- JPH0715132Y2 JPH0715132Y2 JP1989020978U JP2097889U JPH0715132Y2 JP H0715132 Y2 JPH0715132 Y2 JP H0715132Y2 JP 1989020978 U JP1989020978 U JP 1989020978U JP 2097889 U JP2097889 U JP 2097889U JP H0715132 Y2 JPH0715132 Y2 JP H0715132Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- substrate
- gas
- plasma cvd
- cvd apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989020978U JPH0715132Y2 (ja) | 1989-02-23 | 1989-02-23 | プラズマcvd装置の電極構造 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989020978U JPH0715132Y2 (ja) | 1989-02-23 | 1989-02-23 | プラズマcvd装置の電極構造 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02113333U JPH02113333U (en]) | 1990-09-11 |
JPH0715132Y2 true JPH0715132Y2 (ja) | 1995-04-10 |
Family
ID=31237807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989020978U Expired - Lifetime JPH0715132Y2 (ja) | 1989-02-23 | 1989-02-23 | プラズマcvd装置の電極構造 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0715132Y2 (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7267413B2 (ja) * | 2019-05-30 | 2023-05-01 | 京セラ株式会社 | 流路部材 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60180114A (ja) * | 1984-02-27 | 1985-09-13 | Matsushita Electric Ind Co Ltd | 非晶質膜の堆積方法および堆積装置 |
-
1989
- 1989-02-23 JP JP1989020978U patent/JPH0715132Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH02113333U (en]) | 1990-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6940541B2 (ja) | 有機膜形成装置 | |
JP3310171B2 (ja) | プラズマ処理装置 | |
US20200310183A1 (en) | Organic film forming apparatus | |
KR102182180B1 (ko) | 히터 베이스 및 처리 장치 | |
CN114088282B (zh) | 压力传感器 | |
JPH0715132Y2 (ja) | プラズマcvd装置の電極構造 | |
JP2006257495A (ja) | 基板保持部材及び基板処理装置 | |
US5985089A (en) | Plasma etch system | |
TW202205349A (zh) | 用於減少寄生電漿的rf回程路徑 | |
JP2004269968A (ja) | 蒸着用マスク | |
TWI479540B (zh) | 基板處理裝置 | |
JP3151364U (ja) | プラズマ化学気相堆積装置 | |
JPH11274087A (ja) | シャワープレート | |
CN112727787B (zh) | 真空泵 | |
JPH01103828A (ja) | プラズマcvd装置 | |
JP4118117B2 (ja) | プラズマプロセス装置 | |
JP2003086512A (ja) | 真空処理装置 | |
JP2781757B2 (ja) | プラズマcvd装置 | |
JP2701242B2 (ja) | プラズマcvd装置用電極構造 | |
TWI823437B (zh) | 加熱處理裝置 | |
KR101016582B1 (ko) | 용사 돌기 형성용 마스크, 상기 마스크를 이용한 용사 돌기형성 방법 및 상기 마스크를 이용한 기판 지지대 제조방법 | |
US20250210384A1 (en) | Auto fine-tuner for desired temperature profile | |
KR101239694B1 (ko) | 가장자리의 처짐 현상을 개선한 기판안치대 | |
JPS63114118A (ja) | 薄膜加工用圧着ヒ−タ支持装置 | |
KR0140676B1 (ko) | 반도체 기판의 건조장치 |